基于285nm二氧化硅基底的單層氮化硼薄膜
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- 公司名稱 上海巨納科技有限公司
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- 更新時間 2020/12/26 13:50:12
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聯系方式:袁經理 13761090949 查看聯系方式
聯系我們時請說明是儀器網上看到的信息,謝謝!
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 8 packProperties of BN film97% coverage with minor holes and organic residuesHigh Crystalline Quality
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 8 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 8 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 8 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
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